2nm Process

A significant IP breach at TSMC, involving employees and possibly its 2nm process, has led to a legal battle. Tokyo Electron (TEL) confirmed dismissing an employee and attempted appeasement, sending executives to TSMC. However, TSMC rejected TEL’s efforts and initiated legal action, signaling a firm stance against data theft. TSMC will implement internal disciplinary measures. The incident underscores the importance of intellectual property protection in the semiconductor industry.

A recent leak at TSMC, impacting its 2nm process technology R&D and Fab 20 in Hsinchu, involves nine individuals and has sparked industry debate. The breach, detected internally, highlights the challenges of protecting valuable IP. Intriguingly, the leak involves Tokyo Electron (TEL), a partner of Rapidus, intensifying competition in advanced semiconductor manufacturing. TSMC had implemented rigorous security measures, including iPhone replacements and U.S. security expert recruitment. Despite CEO C.C. Wei’s confidence, the leak originated from TSMC’s headquarters, emphasizing the persistent threat of internal security breaches.

TSMC faces pressure from potential U.S. tariffs and demands for significant investment. The U.S. is considering a 20% tariff on Taiwanese exports, prompting negotiation for a rate closer to South Korea and Japan’s 15%. Reports suggest the U.S. seeks a $300 billion investment from TSMC for a massive Arizona fabrication plant, potentially housing future 2nm and 1.4nm processes. This investment, exceeding 30 times TSMC’s equity, follows a prior $165 billion U.S. expansion commitment. TSMC has declined to comment on the rumors.