High-NA

ASML has confirmed its High-NA EUV lithography systems are ready for mass production, a crucial step for next-generation AI. These advanced tools enable chipmakers to etch finer patterns, paving the way for more powerful and efficient AI chips. After extensive testing and demonstrating impressive uptime and precision, the $400 million machines are set for customer qualification. While full integration into high-volume manufacturing will take two to three years, this marks the beginning of a new era in AI capabilities.