Nanoimprint Lithography
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Canon to Expand Lithography System Production for the First Time in 21 Years Amidst AI Boom
Canon will begin operations at its expanded lithography equipment factory in Utsunomiya, Japan, this September, its first expansion in 21 years. Aimed at capturing AI-driven semiconductor demand and challenging ASML, Canon invested $345M in the facility and it will use both UV and nanoimprint lithography (NIL). NIL offers cost and energy savings. Production is projected to reach full capacity by 2027, increasing Canon’s total annual output by 30%. Canon hopes NIL will give it a foothold amidst rapid growth in the AI infrastructure market.
