GAA technology
-
Manufacturing 5nm Without EUV Lithography: 3nm Development Underway
A company is developing 3nm application processors without using EUV lithography, circumventing the conventional path with multi-patterning and step-and-scan systems. Having already achieved 5nm success this way, they aim for a 2025 launch with GAA technology. While ambitious, this approach faces skepticism due to the yield and efficiency challenges associated with DUV-based multi-patterning compared to EUV.
