Semiconductor Metrology
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First Domestically Produced 28nm Critical Dimension Electron Beam Metrology System Rolls Off Production Line, Led by Academician Team
China’s semiconductor industry achieved a milestone with the rollout of the first domestically produced 28nm Critical Dimension Electron Beam Metrology equipment in Wuxi. Developed by Wuxi Gonsin Instruments, the CD-SEM features complete self-reliance in key components. This advancement addresses critical challenges in semiconductor metrology and inspection, filling a vital gap in China’s integrated circuit industry and enhancing self-sufficiency in high-end chip equipment. Gonsin aims to provide comprehensive CD-SEM solutions for diverse semiconductor manufacturing needs.
