First Domestically Produced 28nm Critical Dimension Electron Beam Metrology System Rolls Off Production Line, Led by Academician Team

CNBC AI News, August 15th – A significant breakthrough in China’s semiconductor industry: Wuxi Hi-Tech District Management Committee announced today the successful rollout of the nation’s first domestically produced 28nm Critical Dimension Electron Beam Metrology equipment in Wuxi.

This crucial 28nm CD-SEM (Critical Dimension Scanning Electron Microscope), independently developed by Wuxi Gonsin Instruments, represents a major leap forward. Gonsin achieved complete self-reliance in the electronic optical system, motion platform, electronic circuits, and software. This development is poised to tackle critical challenges in China’s semiconductor metrology and inspection sector.

Experts say the achievement fills a vital gap in the domestic integrated circuit industry, marking a milestone in enhancing the self-sufficiency and control of high-end chip equipment.

CD-SEMs are paramount in chip manufacturing. They meticulously sample and measure critical dimensions, monitoring the size of patterns formed after the photolithography process. This ensures optimal yields by allowing for real-time process correction.

Founded in 2022 in Wuxi Hi-Tech District’s Micro-Nano Park, Wuxi Gonsin Instruments, according to its website, was co-founded by Chinese Academy of Engineering Academician Ding Wenjiang, Chinese Academy of Sciences Academician Zhang Ze, and internationally recognized engineering experts and founders of listed companies. The company’s focus: the R&D, manufacturing, and production of front-end semiconductor metrology and inspection equipment.

Since its inception, Gonsin has maintained robust R&D investment across its projects. The company states that several of its front-end metrology and inspection products are currently undergoing crucial performance optimization and market promotion phases.

Gonsin Instruments aims to provide a comprehensive range of CD-SEM products tailored to meet diverse semiconductor manufacturing metrology requirements. From research and development to high-volume production, the company strives to deliver precise and efficient process control solutions.